The nanoscale pattering of materials and surfaces is very important for a broad range of applications. Nanopatterning techniques that are fast, can efficiently treat large areas, and do not require a mask are particularly attractive. Such techniques include (i) laser-induced periodic surface structuring (LIPSS) with fs laser pulses, (ii) two-photon lithography through photopolymerization, and (iii) pattering using photonic nanojets formed in trapped particles and involve complex multiphysics processes. Our objective is to study the underlying electromagnetic phenomena arising in such fabrication techniques and strive to achieve fine control over the resulting topology.
