Instrumentation for laser-based & other type materials growth and processing (thin films, doping, thermal poling, cutting and polishing)
Thin film preparation using
spin coater with high resolution velocity determination, chamber environment as well as programmable rotation/coating protocol and dip coater.
laser ablation of metallic or ceramic targets in a reactive oxygen ambient atmosphere (R-PLD, Reactive Pulsed Laser Deposition)
The home-made ultra-high vacuum PLD chamber with a close-up of the plume.
Two laser, two-target reactive-PLD (Pulsed-Laser Deposition) for controlled semiconductor doping, including two actively synchronized pulsed lasers (an excimer and a Nd:YAG laser with SHG/THG options), a high vacuum chamber and a stepper-motor controlled XY- translator for the two target mounting and movement.
Double laser-induced plasma during the R-PLD metal oxide thin film doping.
The thermal evaporator used at TPCI for thin coating and electrode deposition.
Home-made Thermal poling (shown here) or corona poling setup used for the creation of nanostructures in isotropic materials and the development of hybrid materials with non-linear optical properties. The setup comprises
High voltage supply (15kV @ 3mA)
Temperature resistant stainless steel cell with special electrodes for high voltage application and vacuum or constant inert gas flow atmosphere